Thesis Abstract and Dissertation Abstracts

Zirconium nitride thin film was successfully deposited on substrate of stainless steel 316 using industrial cathodic arc deposition system. The deposition of films by cathodic arcs is very likely the oldest physical vapor deposition (PVD) technology which uses the vaporization from an electrode under arcing conditions as a source of vaporized material. Different parameters were used to deposit the ZrN thin film such as the base pressure of deposition chamber was about 1.8x10 -2 Pa., flow rates of nitrogen gas was kept at 075 sccm, substrates were biased such as the bias voltage was 150V, the temperature during deposition was recorded about 115oC and the deposition timing was 4 mints. Zirconium nitride thin films have many desirable attributes including high hardness and high melting point, its excellent corrosion resistance, biocompatible and good wear resistance, which make them important protective coating materials for biomedical applications.

The deposited ZrN thin film was characterized by Raman Spectroscopy to explore the molecular information to be gathered about molecular bonds and their vibration modes. Raman Spectra revealed a strong peak at 511.08 cm-1 clearly indicating ZrN phase. Further deposited ZrN thin film was characterized by Wilson 401MVA Vickers micro hardness tester operational at QAU Islamabad. Vickers hardness results confirm that ZrN thin film has high hardness of 2640 HV corresponding to 10 gram imposed load.

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Submission Details: Thesis Abstract submitted by faisal bashir from Pakistan on 08-Mar-2011 19:23.
Abstract has been viewed 3530 times (since 7 Mar 2010).

faisal bashir Contact Details: Email: fb-chaudhary@yahoo.com Phone: 0092-3345798082